Example patterns

Here we show some patterns generated to test the ultimate performance of the system.

The image above shows a grating written on the system using ZEP-520 resist in mode 4 with a 50kV accelerating voltage.

Below is an image showing the finest features written with the system, a linewidth of 9.79nm was achieved, which outperforms the specifications. The stitching accuracy was also tested and found to be better than 15nm, again comfortably within specification.